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Atomic Layer Deposition Systems
SVT Associates' NorthStar™ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8 precursor lines and a hot wall — cross flow deposition chamber, a wide range of applications may be performed from a single system. Sample introduction is rapid and convenient with a quick hatch or the optional load lock. The NorthStar ALD system can be interfaced with other deposition and metrology tools. Integration of in-situ metrology tools and the RoboALD software/system automation increases process reproducibility. SVTA is your source for cost effective atomic layer deposition equipment.
Layer Deposition System Applications:
- High-k Dielectrics
- Nanocoatings
- Surface Modification Layers
- Corrosion protection layers
- Moisture barrier layers
- Device Encapsulations
- MEMS
- Photonic Crystals
Atomic Layer Deposition Equipment Options:
- Load Lock for rapid sample exchange
- Plasma Component
- Ozone Delivery System
- Residual Gas Analysis — QMS
- Quartz Crystal Deposition Monitor
- In-Situ Ellipsometry
- Transfer to UHV deposition systems
ALD Model ALD-P-200B Product Sheet
ALD Model ALD-P-100B Product Sheet