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BOS-18-IW
Beam Imaging Solutions (BIS) introduces the 90-degree BOS which allows remote imaging of a beam at 90 degrees to the imaging plane. The BOS-18-IW can be attached to a linear motion feedthrough and placed into and out of the beam allowing for remote imaging, deep within the vacuum chamber.
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Optional Equipment
Dual MCP Systems, MCP Coatings and MCP Type:
Model BOS-18-IW with BOS-18-IW-OPT-01 dual MCP option
MCPs with optional coating for enhanced imaging of UV and X-rays (KBr, CsI, Cu, CuI, MgO, Au,MgF2)
MCPs with high gain and resolution
MCPs with matched characteristic impedance
Linear motion feedthroughs, electrical fedthroughs, viewports (Contact BIS for more information)
BOS-18-IW With Optional Linear Motion Feedthrough and Beam Attenuation Grids
Phosphor Screen
P-43 is standard but other phosphors are available and include including P1, P11, P15, P20, P22, P24, P31, P45, P46, P47, P48, and P53. See our phosphor screen page for more information. Screens have a standard aluminum overcoat but Indium-Tin-Oxide (ITO) undercoating is also available.
Image Processing Systems (Optional)
Model IPS-1 (Frame grabber (PCI bus), cables, software)
Power Supplies (Optional)
Model MCPPS-1 (MCP Power Supply, Single MCP, 0-1kV)
Model MCPPS-2 (MCP Power Supply, Dual MCP, 0-2kV)
Model PHSPS-1 (Phosphor Screen Power Supply, 0-5kV)
Miscellaneous Options
Beam attenuation grids (90%, 99%, 99.9%)
Please use these criteria when determining number of attenuation grids needed:
Ion beams greater than 3.2 nA/mm2, 90% beam attenuation (1 grid)
Ion beams greater than 31.8 nA/mm2, 99% beam attenuation (2 grids)
Ion beams greater than 318.nA/mm2, 99.9% beam attenuation (3 grids)
Electron suppression grids