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TT-150-RIE/CVD Bench-Top Plasma Tool
AGS TT Plasma Systems Provide All of These Features on a Single Platform
• RIE, PECVD, and Plasma Etch systems are all built on a single, easy to use platform, ensuring low maintenance, training, and operational costs as your technology requirements expand.
• Reconfigure chamber components, materials,and feed gases to provide more process capabilities and technologies over time as you requirements change.
• Experienced staff provides an exceptional technical resource for new process development activities to ensure your new processes are developed ahead of schedule and below cost.
• Small footprint, bench top design requires minimal clean room space.
• Simple process controller ensures fast learning curve for new users, while providing exceptional process control and capabilities.
• Our company’s customer service, engineering,and support services ensure your success, including unlimited phone/email support, full customer training and complete factory testing and qualification prior to system shipment.
• Combine Plasma Etch and PECVD processes on a single system to keep capital costs low