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RF-ICP-Plasma Solutions
Atomic layer deposition (ALD)
Chemical vapor deposition (CVD)
Components for CVD, PECVD, MOCVD, ALD and HVPE Depostion Tools
Customer Tools
CVD Systems
DC and RF Sputtering Source
E-Beam Evaporation
E-Beam Evaporation Source
HEX Series of PVD systems
Ion Beam Milling Systems
Large Substrate Wafer Wet Cleaning Systems
Metalorganic vapour phase epitaxy (MOVPE)
Nano Composites
Nano Materials
Organic Evaporation Source
PA-MOCVD Systems
Plasma chemical vapor deposition (PCVD)
Plasma Cleaning and Ashing Systems
PVD Cluster Systems
PVD systems Glovebox Integration
PVD systems Niobium Software
PVD systems Sample Stage Options
Reactive Ion Etching
RF-ICP-Plasma Solutions
Single Wafer Wet Cleaning
Space Simulation Systems
Sputtering Systems
Thermal Evaporation
Thermal Evaporation Source
Thin Film Deposition Systems
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RF-ICP-Plasma Solutions
RF-ICP-Plasma SolutionsPortfolio
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Built In Plasma Beam Sources
Faraday Cup Measurement System
Linear Plasma Beam Sources
Ring Plasma Beam Sources
Round Plasma Beam Sources
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